Benjamin Bohaty, M.D., FAAD

Board Certified Dermatologist

Benjamin Bohaty, M.D., board-certified dermatologist and graduate of Brown University is committed to the advancement of dermatology knowledge and skin treatment. His professional interests include medical, cosmetic and surgical dermatology.

Dr. Bohaty was born in Nebraska and raised in Ohio. After receiving his undergraduate degree from Miami University (awarded the Oxford Scholars Scholarship all four years) and dermatology training at leading academic centers including Case Western Reserve University, Cleveland Clinic, University of Cincinnati, Northwestern University, University of Texas – Houston, and University of Buffalo, he completed his dermatology residency training at Brown University.

Dr. Bohaty has extensive research experience wherein he has served as investigator for over thirty clinical trials covering a wide range of cutaneous conditions. As sub-investigator, Dr. Bohaty has collaborated with a number of top pharmaceutical and biotechnology companies including Amgen, GlaxoSmithKline, Celgene, Novartis, Genentech, Regeneron, Merz Pharma, Anacor Pharmaceuticals, and Astellas Pharma. His abstracts and articles in the field of dermatology have been published both nationally and internationally in a number of peer-reviewed mediums. In 2010, he was honored to present at the annual American Contact Dermatitis Society meeting and won the Fisher resident competition for his work investigating irritant and allergic contact dermatitis to quaternary ammonium compounds. In 2014, Dr. Bohaty was recognized by the Skin and Allergy News Digital Network for his work investigating a novel sodium hypochlorite formulated wash (CLn® BodyWash) which was found to significantly improve symptoms and quality of life for children who had atopic dermatitis with Staphylococcus aureus colonization.

In his spare time Dr. Bohaty enjoys cycling, downhill skiing, hiking, and golfing. He is also an avid gearhead who has had a love of cars and motorcycles since he was young.